Electromigration in passivated Cu interconnects studied by transmission x-ray microscopy
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منابع مشابه
Electromigration in passivated Cu interconnects studied by transmission x-ray microscopy
Time-resolved x-ray microscopy studies of the electromigration in inlaid Cu line/via structures were performed on focused-ion-beam-prepared cross sections of an advanced interconnect layer system. Multiple x-ray images were recorded at 1.8 keV photon energy while stressing the passivated Cu structures with an applied current. The image sequences show that void formation is a dynamic process, wi...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
سال: 2002
ISSN: 0734-211X
DOI: 10.1116/1.1523403